Quantitative comparison of measurement methods for the evaluation of micro- and nanostructures written with 2PP

Two-Photon Polymerization (2PP) has become an established process for fabricating individual micro-and nanostructures nearly in the last two decades. Its high degree of freedom opened up novel possibilities for a large range of applications like functional structures for cell growth, photonic crystals, nanoantennas, diffractive optical elements and lab-on-a-chip structures (just to name a few). Since the measurement of structures written with 2PP is always very time consuming, we present a comparison between white light interferometry (WLI) and confocal microscopy (CM) which were used for measuring structures written with 2PP. By performing a GageRR analysis with both metrology devices, we calculated the process tolerance one has to accept when measuring these structures with WLI or CM.

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