Increase in oxide hole trap density associated with nitrogen incorporation at the SiO2/SiC interface
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Leonard C. Feldman | Valery V. Afanas'ev | John Rozen | Sokrates T. Pantelides | S. Dhar | L. Feldman | S. Pantelides | J. Rozen | Sanwu Wang | John R. Williams | V. Afanas'ev | Sanwu Wang | Sarit Dhar | S. K. Dixit | F. O. Roberts | H. L. Dang | H. Dang
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