Recombination of oxygen atoms along a glass tube loaded with a copper sample

[1]  D. Mangin,et al.  Nanostructures design by plasma afterglow-assisted oxidation of iron–copper thin films , 2016 .

[2]  Miran Mozetic,et al.  Growth dynamics of copper oxide nanowires in plasma at low pressures , 2015 .

[3]  Thierry Belmonte,et al.  Controlled growth of copper oxide nanostructures by atmospheric pressure micro-afterglow , 2014 .

[4]  R. Cardoso,et al.  Growth of ruthenium dioxide nanostructures by micro-afterglow oxidation at atmospheric pressure , 2014 .

[5]  M. Moisan,et al.  Sterilization/disinfection using reduced-pressure plasmas: some differences between direct exposure of bacterial spores to a discharge and their exposure to a flowing afterglow , 2014 .

[6]  M. Mozetič,et al.  Controlling the oxygen species density distributions in the flowing afterglow of O2/Ar–O2 surface-wave microwave discharges , 2014 .

[7]  M. Moisan,et al.  Packaging materials for plasma sterilization with the flowing afterglow of an N2–O2 discharge: damage assessment and inactivation efficiency of enclosed bacterial spores , 2011 .

[8]  M. Mozetič,et al.  Transition from E to H mode in inductively coupled oxygen plasma: Hysteresis and the behaviour of oxygen atom density , 2011 .

[9]  F. Poncin‐Epaillard,et al.  Comparison between hexatriacontane and stearic acid behaviours under late Ar―O2 post-discharge , 2011 .

[10]  M. Mozetič,et al.  Microwave discharge as a remote source of neutral oxygen atoms , 2011 .

[11]  F. Poncin‐Epaillard,et al.  Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid I: Behaviour of Thin Films , 2011 .

[12]  M. Mozetič,et al.  Comparison of TALIF and catalytic probes for the determination of nitrogen atom density in a nitrogen plasma afterglow , 2009 .

[13]  P. Erra,et al.  Atom-sensitive textiles as visual indicators for plasma post-discharges , 2008 .

[14]  J. Amouroux,et al.  Recombination of oxygen atomic excited states produced by non-equilibrium RF plasma on different semiconductor materials: catalytic phenomena and modelling , 2004 .

[15]  R. Berjoan,et al.  Recombination coefficient of atomic oxygen on ceramic materials under earth re-entry conditions by optical emission spectroscopy , 2003 .

[16]  M. Mozetič,et al.  Comparison of NO titration and fiber optics catalytic probes for determination of neutral oxygen atom concentration in plasmas and postglows , 2003 .

[17]  J. Amouroux,et al.  Heat and mass transfer phenomenon from an oxygen plasma to a semiconductor surface , 2001 .

[18]  M. Fewell,et al.  The Low-Pressure Rf Plasma as a Medium for Nitriding Iron and Steel , 1997 .

[19]  S. Wickramanayaka,et al.  Variation of the Recombination Coefficient of Atomic Oxygen on Pyrex Glass with Applied RF Power , 1991 .

[20]  E. A. Ogryzlo,et al.  THE STUDY OF ELECTRICALLY DISCHARGED O2 BY MEANS OF AN ISOTHERMAL CALORIMETRIC DETECTOR , 1959 .

[21]  J. Linnett,et al.  The recombination of oxygen atoms at surfaces , 1958 .