Thermal characterization and analysis of phase change random access memory

The cross-plane thermal conductivity of Ge2Sb2Te5, either in its amorphous state or fcc crystallized state, and titanium nitride (TiN) thin films has been measured at room temperature by the 3ω method. These materials are involved in the fabrication of phase change random access memory (PC-RAM), Ge2Sb2Te5 and TiN being the PC and pseudoelectrode materials, respectively. The thermal conductivity of insulating SiO2 and ZnS:SiO2 layers was determined too. Each thermal conductivity measurement was performed by the means of at least two strip widths in order to check both the measurement self-consistency and the measurement accuracy. The performance of PC-RAM cells, i.e., the time needed to reach the melting temperature of the PC material and the cooling speed, has been evaluated as a function of both the measured thermal conductivity of the PC material and the reset current intensity independently of the thermal properties of the pseudoelectrodes by the way of analytical formula. The influence of the thicknes...

[1]  Seungmin Lee,et al.  Heat transport in thin dielectric films , 1997 .

[2]  J. F. Webb,et al.  One-dimensional heat conduction model for an electrical phase change random access memory device with an 8F2 memory cell (F=0.15 μm) , 2003 .

[3]  H. Kado,et al.  Nanometer-Scale Erasable Recording Using Atomic Force Microscope on Phase Change Media , 1997 .

[4]  Matthias Wuttig,et al.  Mechanical stresses upon crystallization in phase change materials , 2001 .

[5]  F. Lévy,et al.  Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique , 2001 .

[6]  Cr Tellier,et al.  Size Effects in Thin Films , 1982 .

[7]  S. M. Lee,et al.  Thermal boundary resistance at Ge2Sb2Te5/ZnS:SiO2 interface , 2000 .

[8]  N. Yamada,et al.  Rapid‐phase transitions of GeTe‐Sb2Te3 pseudobinary amorphous thin films for an optical disk memory , 1991 .

[9]  J. C. Jaeger,et al.  Conduction of Heat in Solids , 1952 .

[10]  C. J. Smithells,et al.  Smithells metals reference book , 1949 .

[11]  J. Meusel,et al.  Numerical simulation of the 3ω method for measuring the thermal conductivity , 2002 .

[12]  G. A. Slack,et al.  Thermal Conductivity of Pure and Impure Silicon, Silicon Carbide, and Diamond , 1964 .

[13]  S. Patankar Numerical Heat Transfer and Fluid Flow , 2018, Lecture Notes in Mechanical Engineering.

[14]  Erwin R. Meinders,et al.  Thermal Cross-Erase Issues in High-Data-Density Phase-Change Recording , 2001 .

[15]  L. E. Shelimova,et al.  Thermoelectric Properties of nGeTe · mSb2Te3Layered Compounds , 2001 .

[16]  Noboru Yamada,et al.  Phase-Change Optical Disk Having a Nitride Interface Layer , 1998 .

[17]  James F. Shackelford,et al.  The CRC Materials Science And Engineering Handbook , 1991 .

[18]  Takeo Ohta,et al.  Phase Change Disk Media Having Rapid Cooling Structure , 1989 .

[19]  D. Cahill Thermal conductivity measurement from 30 to 750 K: the 3ω method , 1990 .

[20]  V. Weidenhof,et al.  Structural transformations of Ge2Sb2Te5 films studied by electrical resistance measurements , 2000 .

[21]  H. Scherrer,et al.  Improvements of on-membrane method for thin film thermal conductivity and emissivity measurements , 2005 .

[22]  M. Ghosh,et al.  Electrical resistivity of titanium nitride thin films prepared by ion beam-assisted deposition , 2001 .