Miniaturization of optical components with low power consumption fabricated using a CMOS foundry process can pave the way for dense photonic integrated circuits within nanoelectronic platforms. However, the large spatial extent of evanescent light waves generated during nanoscale light confinement are ubiquitous in silicon photonic devices and are the stumbling roadblock to miniaturization. Here, we demonstrate the control of evanescent waves using all-dielectric metamaterials on a chip. We demonstrate that anisotropic metamaterials open a new degree of freedom in total internal reflection (TIR) to reduce the decay length of evanescent waves. This counterintuitive approach uses optical devices which can have a cladding with a higher average index than the core and marks a departure from interference based confinement as in photonic crystal waveguides or slot waveguides which utilize nanoscale field enhancement. We experimentally show that all-dielectric anisotropic metamaterials can help to reduce the cross-talk more than 30 times and bending loss more than 3 times in ultra-compact photonic circuits, two major attributes that limit the integration density in photonic circuits. We verify our all-dielectric metamaterial platform fabricated on a scalable process with a relatively negligible propagation loss of 3.67 dB/cm paving the way to impact future device designs for dense photonic integration