论文信息 - Metallic thin films by photodecomposition of new inorganic precursors: azide complexes

Metallic thin films by photodecomposition of new inorganic precursors: azide complexes

The deposition of films of metals, metal oxides and metal nitrides on surfaces has attracted a great interest due to their importance in the microelectronic industry. An alternative method, which totally avoids resist technology, is to use the photodecomposition of azide complex layers. We have initiated a study about photodecomposition of new compounds [Cr(N/sub 3/)L(H/sub 2/O)/sub 2/](NO/sub 3/)/sub 2/, [Ni(N/sub 3/)/sub 2/L/sub 2/].10H/sub 2/O, [CuN/sub 3/L](NO/sub 3/) (L=triethanolamine) and [Cr(N/sub 3/)L'(H/sub 2/O)4](NO/sub 3/)/sub 2/, [Cu(N/sub 3/)L'(H/sub 2/O)/sub 2/](NO/sub 3/) (L'=diethanolamine). We have selected the best wavelengths for each complex after a detailed study of UV-spectra. We can obtain thin metallic films of Ni and Cu by photodecomposition of azide complexes.

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