Indium tin oxide ohmic contact to highly doped n-GaN

Abstract The electrical characteristics of the indium tin oxide (ITO) contacts on n-GaN with various doping concentrations have been studied. Ohmic behavior was observed for ITO films on highly doped n-GaN ( n =1×10 19 cm −3 ) without thermal annealing and the measured specific contact resistance was 5.1×10 −4 Ω cm 2 . This result could be attributed to the formation of a tunneling junction on the heavily n-type GaN surface. However, as the thermal annealing was performed to the ITO/n-GaN ( n =1×10 19 cm −3 ) Ohmic contact, it exhibited Schottky characteristics. This result might be due to the microscopic interfacial reaction among In, Sn, O and GaN and their alloys which extend into GaN films, thereby influencing the electrical properties of ITO/n-GaN contacts.