High In-content InGaN layers synthesized by plasma-assisted molecular-beam epitaxy: Growth conditions, strain relaxation, and In incorporation kinetics
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E. Monroy | P. Ruterana | E. Alves | S. Pouget | S. Valdueza-Felip | K. Lorenz | E. Bellet-Amalric | M. Chauvat | A. N'unez-Cascajero | Y. Wang