Improvement of Atomic Layer Deposition Quality Control Method

Atomic layer deposition (ALD) can be used in the fabrication of new materials, optimization of battery electrode surfaces and many other fields. Data-driven quality control method of ALD was studied in this paper, including quality inspection based on image segmentation and quality prediction based on decision tree. The results showed that the algorithms designed in this paper were effective and provided new solutions for the improvement of ALD.

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