Application of the modified voltage-dividing potentiometer to overlay metrology in a CMOS/bulk process
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Loren W. Linholm | M. W. Cresswell | R. A. Allen | T. A. Hill | H. D. Stewart | C. H. Ellenwood | J. C. Owen | J. D. Benecke | S. R. Volk
[1] M. W. Cresswell,et al. Voltage-dividing potentiometer enhancements for high-precision feature placement metrology , 1992, ICMTS 92 Proceedings of the 1992 International Conference on Microelectronic Test Structures.
[2] Loren W. Linholm,et al. Test structure for the in-plane locations of project features with nanometer-level accuracy traceable to a coordinate measurement system , 1993, ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures.