High-efficiency fully etched fiber-chip grating couplers with subwavelength structures for datacom and telecom applications

Surface grating couplers are key components to couple light between planar waveguide circuits in silicon-on-insulator (SOI) platform and optical fibers. Here, we demonstrate by using simulations and experiments that a high coupling efficiency can be achieved for an arbitrary buried oxide thickness by judicious adjustment of the grating radiation angle. The coupler strength is engineered by subwavelength structures, which have pitch and feature sizes smaller than the wavelength of light propagating through it, thereby frustrating diffraction effects and behaving as a homogeneous media with an adjustable equivalent refractive index. This makes it possible to apodize the grating coupler with a preferred single etch fabrication process. The coupling efficiency of the grating coupler is optimized for operating with the transverse electric (TE) polarization state at the wavelengths near 1.3 µm and 1.55 µm, which are the bands relevant for datacom and telecom interconnects applications, respectively. The design and analysis of the grating coupler is carried out using two-dimensional (2-D) Fourier-eigenmode expansion method (F-EEM) and finite difference time domain (FDTD) method. The simulations show a peak fiber-chip coupling efficiency of ‒1:61 dB and ‒ 1:97 dB at 1.3 µm and 1.55 µm wavelengths, respectively, with a minimum feature size of 100 nm, compatible with 193 nm deep-ultraviolet (DUV) lithography. The measurements of our fabricated continuously apodized grating coupler demonstrate fiber-chip coupling efficiency of ‒ 2:16 dB at a wavelength near 1.55 µm with a 3 dB bandwidth of 64 nm. These results open promising prospects for low-cost and high-volume fabrication of surface grating couplers in SOI using 193 nm DUV lithography, which is now used in several silicon photonics foundries. It is also predicted that a coupling efficiency as high as ‒ 0:42 dB can be achieved for the coupler structure with a bottom dielectric mirror.

[1]  Yi Zhang,et al.  Silicon Photonics: The Next Fabless Semiconductor Industry , 2013, IEEE Solid-State Circuits Magazine.

[2]  S. M. Rytov,et al.  Electromagnetic Properties of a Finely Stratified Medium , 2014 .

[3]  P. O'Brien,et al.  Packaging Process for Grating-Coupled Silicon Photonic Waveguides Using Angle-Polished Fibers , 2013, IEEE Transactions on Components, Packaging and Manufacturing Technology.

[4]  Emiko Omoda,et al.  Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography , 2013 .

[5]  D. Dutartre,et al.  Low cost 300mm double-SOI substrate for low insertion loss 1D & 2D grating couplers , 2014, 11th International Conference on Group IV Photonics (GFP).

[6]  Siegfried Janz,et al.  Recent Advances in Silicon Waveguide Devices Using Sub-Wavelength Gratings , 2014, IEEE Journal of Selected Topics in Quantum Electronics.

[7]  Siegfried Janz,et al.  High‐efficiency single etch step apodized surface grating coupler using subwavelength structure , 2014 .

[8]  Alejandro Ortega-Moñux,et al.  Fourier Based Combined Techniques to Design Novel Sub-Wavelength Optical Integrated Devices , 2012 .

[9]  I Molina-Fernández,et al.  Fiber-chip grating coupler based on interleaved trenches with directionality exceeding 95. , 2014, Optics letters.

[10]  A. Ortega-Moñux,et al.  Single etch grating couplers for mass fabrication with DUV lithography , 2012 .

[11]  Siegfried Janz,et al.  Waveguide grating coupler with subwavelength microstructures. , 2009, Optics letters.

[12]  Kresten Yvind,et al.  Fully etched apodized grating coupler on the SOI platform with -0.58 dB coupling efficiency. , 2014, Optics letters.

[13]  Chao Li,et al.  CMOS-compatible high efficiency double-etched apodized waveguide grating coupler. , 2013, Optics express.

[14]  Xia Chen,et al.  Polarization-independent grating couplers for silicon-on-insulator nanophotonic waveguides. , 2011, Optics letters.

[15]  Ke Xu,et al.  Wideband subwavelength gratings for coupling between silicon-on-insulator waveguides and optical fibers. , 2012, Optics letters.

[16]  R Orobtchouk,et al.  Silicon Photonic Circuits: On-CMOS Integration, Fiber Optical Coupling, and Packaging , 2011, IEEE Journal of Selected Topics in Quantum Electronics.

[17]  Siegfried Janz,et al.  Waveguide sub‐wavelength structures: a review of principles and applications , 2015 .

[18]  G. Masini,et al.  A multi-wavelength 3D-compatible silicon photonics platform on 300mm SOI wafers for 25Gb/s applications , 2013, 2013 IEEE International Electron Devices Meeting.

[19]  Ray T. Chen,et al.  Colorless grating couplers realized by interleaving dispersion engineered subwavelength structures , 2013, CLEO: 2013.

[20]  Siegfried Janz,et al.  Refractive index engineering with subwavelength gratings for efficient microphotonic couplers and planar waveguide multiplexers. , 2010, Optics letters.

[21]  A. Rickman The commercialization of silicon photonics , 2014, Nature Photonics.

[22]  Manfred Berroth,et al.  Bridging the gap between optical fibers and silicon photonic integrated circuits. , 2014, Optics express.

[23]  Yurii A. Vlasov,et al.  Silicon CMOS-integrated nano-photonics for computer and data communications beyond 100G , 2012, IEEE Communications Magazine.

[24]  P. Verheyen,et al.  High-efficiency fiber-to-chip grating couplers realized using an advanced CMOS-compatible silicon-on-insulator platform. , 2010, Optics express.

[25]  T Pinguet,et al.  A Grating-Coupler-Enabled CMOS Photonics Platform , 2011, IEEE Journal of Selected Topics in Quantum Electronics.

[26]  Jens H. Schmid,et al.  Silicon Photonic Integration Platform—Have We Found the Sweet Spot? , 2014, IEEE Journal of Selected Topics in Quantum Electronics.

[27]  Chao Li,et al.  Review of Silicon Photonics Foundry Efforts , 2014, IEEE Journal of Selected Topics in Quantum Electronics.