Aggressively Scaled Atomic Layer Deposited Amorphous InZnOx Thin Film Transistor Exhibiting Prominent Short Channel Characteristics (SS= 69 mV/dec.; DIBL = 27.8 mV/V) and High Gm(802 μS/μm at VDS = 2V)
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T. Chao | Y. Tseng | C. Kei | Chun-Hsiung Lin | Chun-Chieh Lu | Dong-Ru Hsieh | E. Chang | Li-Chi Peng | Huai-Ying Huang | Yu-Lon Lin | Yu-Cheng Lu | Yan-Kui Liang | Tsung-Te Chou | June-Yang Zheng | Wei-Li Li