The X-ray energy response of silicon (B): Measurements

Abstract In this, the second part of a detailed study of the interaction of soft X-rays with silicon, we summarise the results of a large number of experiments on charge coupled devices (CCDs), carried out both in our laboratory and at the Daresbury Synchrotron Radiation Source (SRS). Measurements of the energy variation of the W parameter and of the Fano factor F are in substantial agreement with the predictions of the model developed in Part (A) of the study [G.W. Fraser et al., Nucl. Instr. and Meth. A 350 (1994) 368]. The consequences of using a Gaussian pulse height distribution model in the experimental determination of F are discussed. Variations in X-ray event morphology (i.e. the frequency distribution of single-, two-, three-pixel events) across the silicon K edge are described. Measurements of CCD quantum detection efficiency Q (counts/photon) showing XAFS (X-ray absorption fine structure) modulation in the vicinity of the Si K edge are compared with calculations based upon new, experimentally-determined linear absorption coefficients for Si, SiO 2 and Si 3 N 4 . Finally, the X-ray photoyield from silicon is described, both experimentally and theoretically.