论文信息 - Characterization of chemical bonding features and defect state density in HfSiOx Ny /SiO2 gate stack - 字舞流文

Characterization of chemical bonding features and defect state density in HfSiOx Ny /SiO2 gate stack

S. Inumiya | K. Makihara | S. Higashi | S. Miyazaki | H. Murakami | A. Ohta | Y. Nara | Y. Munetaka | A. Tsugou