Fabrication of stretchable MoS2 thin-film transistors using elastic ion-gel gate dielectrics
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Lain-Jong Li | Yoshihiro Iwasa | Jiang Pu | Taishi Takenobu | Lain‐Jong Li | J. Pu | T. Takenobu | Jacob Tse-Wei Wang | Y. Iwasa | Yijin Zhang | Y. Wada | Yijin Zhang | Yoshifumi Wada | Yoshifumi Wada
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