Influence of SiC Surface Preparation on Homoepitaxial Growth; X-ray Reflectometric Studies
暂无分享,去创建一个
W. Strupinski | W. Graeff | W. Wierzchowski | K. Wieteska | K. Kościewicz | K. Mazur | H. Sakowska | W. Hofman
[1] E. Ozbay,et al. The influence of substrate surface preparation on LP MOVPE GaN epitaxy on differently oriented 4H-SiC substrates , 2008 .
[2] H. Tsuchida,et al. Formation of basal plane Frank-type faults in 4H-SiC epitaxial growth , 2008 .
[3] J. Sumakeris,et al. Glide and multiplication of basal plane dislocations during 4H-SiC homoepitaxy , 2007 .
[4] Ishwara B. Bhat,et al. Electro-chemical mechanical polishing of silicon carbide , 2004 .
[5] K. Kojima,et al. Direct observation of dislocations propagated from 4H–SiC substrate to epitaxial layer by X-ray topography , 2004 .
[6] A. Ellison,et al. Dislocation-evolution in 4H-SiC epitaxial layers , 2002 .
[7] M. Servidori,et al. Analysis of (n, - n) and (n, - n, n) x-ray rocking curves of processed silicon , 1993 .
[8] B. Lengeler,et al. Determination of the dispersive correction f'(E) to the atomic form factor from X‐ray reflection , 1992 .
[9] Tadatomo Suga,et al. Mechanochemical Polishing of Silicon Carbide Single Crystal with Chromium(III) Oxide Abrasive , 1992 .