5 kV multielectron beam lithography: MAPPER tool and resist process characterization
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L. Pain | B. Icard | Christophe Constancias | D. Rio | J. Vijverberg | Mickael Martin | D. Rio | C. Constancias | B. Icard | J. V. Nieuwstadt | J. Vijverberg | L. Pain | Mickael Martin | J. van Nieuwstadt
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