Lithography apparatus and patterning method using the same

A lithographic apparatus according to the present invention, the stage that a sample is placed; A first light source to provide light for observing the sample on the stage; Of the eyepiece to observe a sample on the stage includes an optical system; Image acquisition means for acquiring an image of the sample is observed through an optical system; Been provided with an image obtained by the image obtaining means, image editing means for editing the image supplied; Is entered into the optical system, it receives the image signal of the edited image in the image editing means, and displays the received video liquid crystal panel for performing photo-mask features; A second light source to the image displayed by the liquid crystal panel as a photomask, provide light for performing exposure to the sample; It includes.