Static and dynamic characterization of large-area high-current-density SiC Schottky diodes
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M. Zafrani | M. Melloch | J. Cooper | D. Morisette | G. Dolny | P. Shenoy | J. Woodall | M. Zafrani | J.M. Woodall | M.R. Melloch | J.A. Cooper | J. Gladish | G.M. Dolny | D.T. Morisette | P.M. Shenoy | J. Gladish | P. Shenoy
[1] M. Melloch,et al. Dopant activation and surface morphology of ion implanted 4H- and 6H-silicon carbide , 1998 .
[2] M. Bozack,et al. High‐temperature ohmic contact to n‐type 6H‐SiC using nickel , 1995 .
[3] T. Kimoto,et al. Excellent reverse blocking characteristics of high-voltage 4H-SiC Schottky rectifiers with boron-implanted edge termination , 1996, IEEE Electron Device Letters.
[4] R. Held,et al. SiC Merged p-n/Schottky Rectifiers for High Voltage Applications , 1997 .
[5] M. Bhatnagar,et al. Edge terminations for SiC high voltage Schottky rectifiers , 1993, [1993] Proceedings of the 5th International Symposium on Power Semiconductor Devices and ICs.
[6] S. M. Sze,et al. Physics of semiconductor devices , 1969 .
[7] M. Melloch,et al. Design considerations and experimental analysis of high-voltage SiC Schottky barrier rectifiers , 1998 .