Electron lifetime of heavily Be-doped In0.53Ga0.47As as a function of growth temperature and doping density
暂无分享,去创建一个
Mohammed Zaknoune | F. Mollot | F. Mollot | E. Lefebvre | D. Vignaud | M. Zaknoune | Dominique Vignaud | J. Lampin | J.-F. Lampin | E. Lefebvre
[1] C. Henry,et al. Radiative and nonradiative lifetimes in n-type and p-type 1.6 μm InGaAs , 1984 .
[2] Toshiaki Kagawa,et al. Ultrafast 1.55‐μm photoresponses in low‐temperature‐grown InGaAs/InAlAs quantum wells , 1994 .
[3] Richard K. Ahrenkiel,et al. Recombination lifetime of In0.53Ga0.47As as a function of doping density , 1998 .
[4] D. Mcinturff,et al. Trapping and recombination dynamics of low-temperature-grown InGaAs/InAlAs multiple quantum wells , 1998 .
[5] S. Hausser,et al. Auger recombination in bulk and quantum well InGaAs , 1990 .
[6] T. Ishibashi,et al. Minority electron lifetimes in heavily doped p‐type GaAs grown by molecular beam epitaxy , 1991 .
[7] A. Konczykowska,et al. Investigation of carbon-doped base materials grown by CBE for Al-free InP HBTs , 2000 .
[8] Hiroshi Ito,et al. Evaluation of base transit time in ultra-thin carbon-doped base InP/lnGaAs heterojunction bipolar transistors , 1996 .
[9] S. Chandrasekhar,et al. Diffusive base transport in narrow base InP/Ga0.47In0.53As heterojunction bipolar transistors , 1991 .