Future challenges and opportunities for heterogeneous process technology. Towards the thin films, Zero Intrinsic Variability devices, Zero Power era
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P. Batude | M. Vinet | F. Andrieu | T. Ernst | S. Deleonibus | E. Beigne | E. Vianello | O. Weber | L. Perniola | L. Pain | S. Barnola | X. Baillin | H. Moriceau | R. Tiron | F. Martin | O. Cueto | F. Nemouchi | C. Le Royer | N. Posseme | R. Salot | L. Duraffourg | X. Jehl | M. Sanquer | S. Tedesco | B. de Salvo | D. Cooper | T. Signamarcheix | G. Poupon | J. Arcamone | H. Fanet | L. Hutin | O. Faynot | A. Villalon | Y. Lamy | C. Poulain | F. Bertin | L. DiCioccio | H. Okuno | D. Gasparutto
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