Apparatus for processing substrate with plasma

The present invention relates to a plasma processing apparatus which generates a plasma in a vacuum carried out a predetermined process on the substrate. The present invention provides a plasma processing apparatus using plasma in a vacuum carried out a predetermined process to the substrate, is provided inside the plasma processing apparatus, the substrate with placing a substrate thereon for; The mounting is provided to drive in a direction perpendicular to the large outer side, temporarily supporting the outer lifting bar to help the process of positioning the substrate stage to the substrate; doedoe further provided, the external lifting bar, in a vertical direction a drive shaft for driving; The upper end of the drive shaft, is provided in combination such that the drive shaft and perpendicular to the substrate support portion which projects into the substrate has the mount table direction during loading; Doedoe provided coupled to the upper end of the drive shaft to surround the substrate supporting part from the outside, the projecting, the outer skin in a side wall of the substrate mounting table direction is open to allow the evacuation of the said substrate support; The substrate support and the outer skin, comprising: a is to provide a plasma processing apparatus, characterized in that driven by the drive shaft at the same time in a vertical direction, to initiate an external lifting bars having a simple structure, and lowers the manufacturing cost, the manufacturing process easily, and it provides a maintenance work is simple plasma processing apparatus.