Determination of parameters for channeling of protons in SiC polytype crystals in the backscattering geometry

[1]  T. Paradellis,et al.  Determination of the stopping power of channeled protons in SiO2 in the backscattering geometry , 2001 .

[2]  C. Zetterling,et al.  Structural and electrical characteristics of oxygen-implanted 6H-SiC , 2000 .

[3]  J. Dias,et al.  ELECTRONIC STOPPING POWER OF (1 0 0) AXIAL CHANNELED 7LI IONS IN SI CRYSTALS , 1999 .

[4]  V. Chu,et al.  (p,p) non-Rutherford backscattering analysis of silicon carbide , 1998 .

[5]  R. Yankov,et al.  Damage in silicon carbide induced by Rutherford backscattering analysis , 1998 .

[6]  X. Aslanoglou,et al.  Simulations of channeling spectra in the system p+28Si , 1998 .

[7]  E. Kótai Measurement of the stopping powers for channeled ions in ion implanted single crystals , 1996 .

[8]  Werner Wesch,et al.  Silicon carbide: Synthesis and processing , 1996 .

[9]  D. Hetherington Measurements of the random and channeled stopping powers for He ions in InP , 1996 .

[10]  Lothar Frey,et al.  Model for the electronic stopping of channeled ions in silicon around the stopping power maximum , 1995 .

[11]  M. Behar,et al.  Electronic stopping power of 〈100〉 axial-channelled He ions in Si crystals , 1995 .

[12]  Li Zhengmin,et al.  Cross section measurements for 170° backscattering of protons from carbon in the energy range 0.3–3.0 MeV , 1993 .

[13]  R. Amirikas,et al.  MEASUREMENT OF (P, P) ELASTIC CROSS-SECTIONS FOR C, O AND SI IN THE ENERGY-RANGE 1.0-3.5 MEV , 1993 .

[14]  D. Boerma,et al.  THE RELATION BETWEEN DEPTH AND ENERGY IN CHANNELING EXPERIMENTS , 1988 .

[15]  F. Zignani,et al.  Determination of random and aligned stopping powers for 80–300 keV protons in silicon by back-scattering measurements , 1977 .

[16]  H. Jack Dechanneling of Protons in Copper Single Crystals. , 1971 .

[17]  R. Hellborg The Energy Loss of Channeled Protons Determined in an Indirect Way , 1971 .