ACCELERATED CURRENT TEST FOR FM TUNNEL OXIDE EVALUATION
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[1] Jack C. Lee,et al. Modeling and characterization of gate oxide reliability , 1988 .
[2] M. Kerber,et al. Interface degradation and dielectric breakdown of thin oxides due to homogeneous charge injection , 1989 .
[3] M. Lenzlinger,et al. Fowler‐Nordheim Tunneling into Thermally Grown SiO2 , 1969 .
[4] E. Harari. Dielectric breakdown in electrically stressed thin films of thermal SiO2 , 1978 .
[5] Arnold Berman,et al. Time-Zero Dielectric Reliability Test by a Ramp Method , 1981, 19th International Reliability Physics Symposium.