Titanium oxide/aluminum oxide multilayer reflectors for "water-window" wavelengths
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Koichi Toyoda | Minoru Obara | Hiroshi Kumagai | K. Toyoda | H. Kumagai | M. Obara | Katsutaro Kobayashi | Y. Iimura | Katsutaro Kobayashi | Y. Iimura | K. Kobayashi
[1] G. Higashi,et al. Sequential surface chemical reaction limited growth of high quality Al2O3 dielectrics , 1989 .
[2] V. V. Kondratenko,et al. Synthesis and measurement of normal incidence X-ray multilayer mirrors optimized for a photon energy of 390 eV , 1994 .
[3] E. Spiller,et al. THE FABRICATION OF MULTILAYER X‐RAY MIRRORS , 1980 .
[4] Koichi Toyoda,et al. Fabrication of titanium oxide thin films by controlled growth with sequential surface chemical reactions , 1995 .
[5] Koichi Toyoda,et al. Comparative Study of Al2O3 Optical Crystalline Thin Films Grown by Vapor Combinations of Al(CH3)3/N2O and Al(CH3)3/H2O2 , 1993 .
[6] B. L. Henke,et al. X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92 , 1993 .
[7] Y. Kawamura,et al. Fabrication of Multilayers with Growth Controlled by Sequential Surface Chemical Reactions , 1994 .
[8] Jiaping Fan,et al. Low-Temperature Growth of Thin Films of Al2O3 by Sequential Surface Chemical Reaction of trimethylaluminum and H2O2 , 1991 .
[9] Koichi Toyoda,et al. In situ ellipsometric diagnostics for controlled growth of metal oxides with surface chemical reactions , 1994 .
[10] T. Barbee,et al. Molybdenum-silicon multilayer mirrors for the extreme ultraviolet. , 1985, Applied optics.
[11] Minoru Obara,et al. Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions , 1996 .