How to control defect formation in monolithic III/V hetero-epitaxy on (100) Si? A critical review on current approaches
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Niamh Waldron | Robert Langer | Andreas Schulze | Bernardette Kunert | Y. Mols | N. Waldron | Y. Mols | R. Langer | B. Kunert | Marina Baryshniskova | A. Schulze | Marina Baryshniskova
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