Nonvolatile memory cells based on the effect of resistive switching in depth-graded ternary HfxAl1 − xOy oxide films
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S. A. Zaitsev | Y. Lebedinskii | K. Bulakh | A. Baturin | O. Orlov | D. Negrov | A. Markeev | K. V. Egorov | A. Kuzin | A. V. Zablotskii | E. Gornev | A. A. Chuprik