论文信息 - High-Q Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193 nm Immersion Lithography - 字舞流文

High-Q Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193 nm Immersion Lithography

P. Absil | J. Van Campenhout | P. Bienstman | D. van Thourhout | S. Selvaraja | W. Xie | M. Fiers