Structural and morphological studies of Co/SiO2 discontinuous multilayers

Abstract This work aims to study the structural properties of Co-SiO 2 discontinuous multilayers, obtained by magnetron sputtering. Such structure consisting of equally spaced planes of Co aggregates is embedded in a SiO 2 matrix. According to the nanostructure, the size of the metallic aggregates and the mean distance between them, the magnetic and transport properties of the discontinuous multilayers can be strongly modified. We used grazing incidence small angle X-ray scattering technique (GISAXS) for the structural and morphological characterisation of metallic aggregates in some selected multilayers, as a function of the metal thickness and annealing conditions after deposition. GISAXS measurements were carried out at the ESRF on ID01 beamline. Below the percolation threshold, we are able to determine the aggregate density by this technique. The in-plane structure of the sample varies with the nominal thickness and annealing up to 400°C seems to have a weak effect on the film characteristics.