The analysis of layout and correction performance of adaptive optics system based on bimorph deformable mirror

Wavefront sensor and wavefront corrector are two important parts of adaptive optics (AO) systems, which must match well in order to achieve optimal aberration correction performance. In this paper, for a selected 35-elemenet bimorph deformable mirror, which is made by Institute of Optics and Electronics (IOE), Shack-Hartmann wavefront sensors are designed and analyzed with two different layouts, square layout and annular layout. A simulation model is established to evaluate the correction performance of the system. Within each layout, wavefront sensors with different number of subapertures are compared and analyzed. The best matching Shack-Hartmann wavefront sensor design is obtained by minimizing the condition number and wavefront correction error. The results show that higher correction performance can be achieved with square configuration and there is an optimal subaperture number for this selected deformable mirror.

[1]  Gleb Vdovin,et al.  Low-cost deformable mirrors: technologies and goals , 2005, SPIE Optics + Photonics.

[2]  Wenhan Jiang,et al.  Optimum matching of wavefront sensor and wavefront corrector , 1995, Optics & Photonics.

[3]  Wenhan Jiang,et al.  Hartmann-Shack wavefront sensing and wavefront control algorithm , 1990, Other Conferences.

[4]  L. Thibos,et al.  Standards for reporting the optical aberrations of eyes. , 2002, Journal of refractive surgery.

[5]  D. Williams,et al.  Monochromatic aberrations of the human eye in a large population. , 2001, Journal of the Optical Society of America. A, Optics, image science, and vision.