CLEAN TRACK solutions for defectivity and CD control towards 5 nm and smaller nodes
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Satoru Shimura | Philippe Foubert | Kathleen Nafus | Shinichiro Kawakami | Keisuke Yoshida | Yuya Kamei | Takahiro Shiozawa | Arnaud Dauendorffer | Noriaki Nagamine | Akihiro Sonoda
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[2] Philippe Foubert,et al. New coater/developer technologies for CD control and defectivity reduction towards 5 nm and smaller nodes , 2019, Photomask Technology.