论文信息 - Phenomenological Modeling of Low-Bias Sulfur Hexafluoride Plasma Etching of Silicon - 字舞流文

Phenomenological Modeling of Low-Bias Sulfur Hexafluoride Plasma Etching of Silicon

U. Schmid | A. Hössinger | J. Weinbub | G. Wachter | M. Trupke | L. F. Aguinsky | Frâncio Rodrigues