Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices.
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Yuqing Jiao | Longfei Shen | Jos van der Tol | Erik Jan Geluk | Barry Smalbrugge | Josselin Pello | J. V. D. van der Tol | B. Smalbrugge | Y. Jiao | E. Geluk | J. Pello | M. Smit | Meint Smit | Longfei Shen | Alonso Millan Mejia | A. M. Mejia
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