Laser-induced damage resistance of AlF3 films
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Jian Sun | Jianda Shao | Kui Yi | Weili Zhang | X. Li | Jian Sun | J. Shao | Kui Yi | Weili Zhang | X. Li
[1] R. Swanepoel. Determination of the thickness and optical constants of amorphous silicon , 1983 .
[2] H. Macleod,et al. Densification of aluminum fluoride thin films by ion-assisted deposition , 1988 .
[3] E. Quesnel,et al. Characterization of magnesium fluoride thin films deposited by direct electron beam evaporation , 2000 .
[4] J. Ferrón,et al. Growth of AlF3 thin films on GaAs(110). Structure and chemical stability , 2001 .
[5] Cheng-Chung Lee,et al. Characterization of AlF3 thin films at 193 nm by thermal evaporation. , 2005, Applied optics.
[6] Cheng-Chung Lee,et al. AlF(3) thin films deposited by reactive magnetron sputtering with Al target. , 2007, Optics express.
[7] Cheng-chung Lee,et al. Developing new manufacturing methods for the improvement of AlF3 thin films. , 2008, Optics express.
[8] C. Jaing,et al. Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas , 2009 .
[9] J. Hsu,et al. AlF3 film deposited by IAD with end-Hall ion source using SF6 as working gas , 2009 .
[10] Jian Sun,et al. Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region. , 2012, Applied optics.