Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns
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Cynthia B. Brooks | Rex B. Anderson | Jason O. Clevenger | Corey Collard | Monika Halim | Turgut Sahin | Alfred Mak
[1] Rex B. Anderson,et al. Study of the Role of Cl2, O2, and He in the Chrome Etch Process with Optical Emission Spectroscopy , 2002, Photomask Technology.
[2] Yi-Chiau Huang,et al. In-situ optical emission spectroscopic examination of chrome etch for photomasks , 2002, Photomask Japan.