Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

Patterning a Molecular Glass Lithographic patterning for device fabrication is usually based on initiating polymerization reactions with photons or electrons in a molecular resist. However, patterning can be achieved by mechanically removing a hard resist with scanning probe microscopy tips, but in many cases the resolution is low and excess material is left on the surface. Pires et al. (p. 732, published online 22 April) found that thin films of organic molecules could form glasses through weak interactions and be patterned to tens of nanometers with a heated scanning probe tip. These patterns could be transferred to other substrates or sculpted into three-dimensional shapes by successive rounds of patterning. A molecular glass can be patterned to dimensions of tens of nanometers with a heated scanning probe tip. For patterning organic resists, optical and electron beam lithography are the most established methods; however, at resolutions below 30 nanometers, inherent problems result from unwanted exposure of the resist in nearby areas. We present a scanning probe lithography method based on the local desorption of a glassy organic resist by a heatable probe. We demonstrate patterning at a half pitch down to 15 nanometers without proximity corrections and with throughputs approaching those of Gaussian electron beam lithography at similar resolution. These patterns can be transferred to other substrates, and material can be removed in successive steps in order to fabricate complex three-dimensional structures.