Performance Analysis of Double EWMA Controller Under Dynamic Models With Drift

This paper mainly focuses on the performance of the double exponentially weighted moving average (DEWMA) controller applied to a first-order dynamic input–output model with process drift. Under a general process disturbance, based on Jury test, the necessary and sufficient conditions involving model parameters, the estimated process gain, and weighting factors are established to ensure that the closed-loop system is asymptotically stable. In addition, we explore why we should use the DEWMA controller to adjust the process rather than the single exponentially weighted moving average controller when the process drifts considerably. Later, under the stability condition, the control performance analysis of the closed-loop system is performed in terms of the asymptotical variation and the transient deviation. Then, an optimization model is established to figure out the appropriate weighting factors for reducing the overall variation of the process output during the process of operation. Finally, extensive simulations are carried out to demonstrate the validity of the theoretical analysis in the context of chemical mechanical polishing process.

[1]  S. Joe Qin,et al.  Semiconductor manufacturing process control and monitoring: A fab-wide framework , 2006 .

[2]  S. W. Butler,et al.  Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry , 1994 .

[3]  Evanghelos Zafiriou,et al.  An approach to run-to-run control for rapid thermal processing , 1995, Proceedings of 1995 American Control Conference - ACC'95.

[4]  Sheng-Tsaing Tseng,et al.  A Multivariate EWMA Controller for Linear Dynamic Processes , 2016, Technometrics.

[5]  Arnon M. Hurwitz,et al.  Run-to-Run Process Control: Literature Review and Extensions , 1997 .

[6]  Enrique Del Castillo,et al.  AN ANALYSIS AND MIMO EXTENSION OF A DOUBLE EWMA RUN-TO-RUN CONTROLLER FOR NON-SQUARED SYSTEMS , 2003 .

[7]  Armann Ingolfsson,et al.  Stability and Sensitivity of an EWMA Controller , 1993 .

[8]  Pramod P. Khargonekar,et al.  A probabilistic approach to run-to-run control , 1998 .

[9]  Sheng-Tsaing Tseng,et al.  Stability and performance of a double MEWMA controller for drifted MIMO systems , 2008 .

[10]  ENRIQUE DEL CASTILLO Long run and transient analysis of a double EWMA feedback controller , 1999 .

[11]  Sheng-Tsaing Tseng,et al.  Stability analysis of single EWMA controller under dynamic models , 2009 .

[12]  James Moyne,et al.  Adaptive extensions to a multibranch run‐to‐run controller for plasma etching , 1995 .

[13]  David C. Drain Run-to-Run Control in Semiconductor Manufacturing , 2002 .

[14]  Christopher A. Bode,et al.  Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities , 2000, Autom..

[15]  Sheng-Tsaing Tseng,et al.  Quasi-minimum mean square error run-to-run controller for dynamic models , 2014 .

[16]  Gen-Ke Yang,et al.  Stability and Control Performance Analysis of Double EWMA Controller With Metrology Delay , 2016, IEEE Transactions on Semiconductor Manufacturing.

[17]  Chyi-Tsong Chen,et al.  An Intelligent Run-to-Run Control Strategy for Chemical–Mechanical Polishing Processes , 2010, IEEE Transactions on Semiconductor Manufacturing.

[18]  Ruey-Shan Guo,et al.  Age-based double EWMA controller and its application to CMP processes , 2001 .

[19]  James Moyne,et al.  Run by run control of chemical-mechanical polishing , 1996 .

[20]  Enrique Del Castillo,et al.  Some Properties of EWMA Feedback Quality Adjustment Schemes for Drifting Disturbances , 2001 .

[21]  Shu-Kai S. Fan,et al.  SISO run-to-run feedback controller using triple EWMA smoothing for semiconductor manufacturing processes , 2002 .

[22]  Cheng-Ching Yu,et al.  Control relevant issues in semiconductor manufacturing : Overview with some new results , 2007 .

[23]  S. Tseng,et al.  A study on a multivariate EWMA controller , 2002 .

[24]  Enrique Del Castillo,et al.  A multivariate double EWMA process adjustment scheme for drifting processes , 2002, IIE Transactions.

[25]  Sheng-Tsaing Tseng,et al.  Statistical design of double EWMA controller , 2002 .

[26]  Gen-Ke Yang,et al.  Performance analysis and comparison between two forms of double EWMA controllers in industrial process , 2015, 2015 International Conference on Control, Automation and Robotics.