Threshold voltage of thin-film Silicon-on-insulator (SOI) MOSFET's
暂无分享,去创建一个
[1] T.C. Holloway,et al. Characteristics of MOSFETs fabricated in laser-recrystallized polysilicon islands with a retaining wall structure on an insulating substrate , 1980, IEEE Electron Device Letters.
[2] Dielectric isolation technology for bipolar and MOS integrated circuits , 1980 .
[3] H. Ariyoshi,et al. A two-dimensional analysis for MOSFET's fabricated on buried SiO2layer , 1980, IEEE Transactions on Electron Devices.
[4] J. Gibbons,et al. One-gate-wide CMOS Inverter on laser-recrystallized polysilicon , 1980, IEEE Electron Device Letters.
[5] E. Worley. Theory of the fully depleted SOS/MOS transistor , 1980 .
[6] M. Geis,et al. n‐channel deep‐depletion metal‐oxide‐semiconductor field‐effect transistors fabricated in zone‐melting‐recrystallized polycrystalline Si films on SiO2 , 1981 .
[7] Z.P. Sobczak,et al. Device fabrication in {100} silicon-on-oxide produced by a scanning CW-laser-induced lateral seeding technique , 1982, IEEE Transactions on Electron Devices.
[8] A. Tasch,et al. Chapter 1 - Silicon-on-Insulator for VLSI and VHSIC , 1982 .
[9] Yannis Tsividis. Moderate inversion in MOS devices , 1982 .
[10] K. Ohwada,et al. A buried channel/surface channel CMOS IC isolated by an implanted silicon dioxide layer , 1982, IEEE Transactions on Electron Devices.
[11] Lex A. Akers,et al. Threshold voltage models of short, narrow and small geometry MOSFET's: A review , 1982 .