论文信息 - An effective method of characterization poly gate CD variation and its impact on product performance and yield - 字舞流文

An effective method of characterization poly gate CD variation and its impact on product performance and yield

Feng Wang | Zhi-Min Ling | Xiao-Yu Li | Tho Le La | Ji-Fu Kung | M. H. Wang | Horng Nan Chern | Chia-Pin Lee

[1] T. Linton,et al. Determination of the line edge roughness specification for 34 nm devices , 2002, Digest. International Electron Devices Meeting,.