Paper VII (viii) Tribochemical Reaction of Oxygen and Water on Silicon Surfaces

The tribo-chemistry of silicon ceramics was investigated by using pure silicon and silicon oxide under a controlled environment. Si-H bonding is extensively formed in wear particles of silicon in humid atmospheres but not in SiO2 nor Si3N4. In explaining Si-H formation related to tribo-chemistry and particle detachment from surface, it is concluded that water molecules react as molecules and all the water atoms contributed to the reaction. Wear particles are separated from the substrate in the Si/SiO2 interface area before or slightly after oxide grows. The reason why oxygen is less reactive than water is also suggested. These results were compared in case of silicon ceramics, and tribochemical reaction models were proposed for silicon oxide, nitride and carbide, with water and oxygen.

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