Multistep, In-Situ Single Wafer Processing - Materials, Device and Equipment Issues
暂无分享,去创建一个
[1] P. Rudman,et al. The kinetics of photodissolution of Ag in amorphous As2S3 films , 1976 .
[2] Yoshihiko Mizushima,et al. Dry development of Se‐Ge inorganic photoresist , 1980 .
[3] Seitaro Matsuo,et al. Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma , 1983 .
[4] James F. Gibbons,et al. Limited reaction processing: Silicon epitaxy , 1985 .
[5] Microwave Plasma LPCVD of Tungsten in a Cold-Wall Lamp-Heated Rapid Thermal Processor , 1987 .
[6] K. Wasa,et al. Properties of Silicon Oxynitride Films Prepared by ECR Plasma CVD Method , 1988 .