Absolute calibration of a multilayer-based XUV diagnostic

[1]  A. Lumpkin.  Potential applications of a dual-sweep streak camera system for characterizing particle and photon beams of VUV, XUV, and X-ray FELs☆ , 1995 .

[2]  J. Bardwell,et al.  Sampling depth of total electron and fluorescence measurements in Si L- and K-edge absorption spectroscopy , 1996 .

[3]  Frank Scholze,et al.  Detector calibration at the PTB radiometry laboratory at BESSY , 1996 .

[4]  H Rabus,et al.  Synchrotron-radiation-operated cryogenic electrical-substitution radiometer as the high-accuracy primary detector standard in the ultraviolet, vacuum-ultraviolet, and soft-x-ray spectral ranges. , 1997, Applied optics.

[5]  F. Scholze,et al.  Mean energy required to produce an electron-hole pair in silicon for photons of energies between 50 and 1500 eV , 1998 .

[6]  L. A. Shmaenok,et al.  EXTREME ULTRAVIOLET SPECTROSCOPY OF A LASER PLASMA SOURCE FOR LITHOGRAPHY , 1998 .

[7]  R. Stuik,et al.  Demonstration of a foil trap technique to eliminate laser plasma atomic debris and small particulates , 1998, Advanced Lithography.

[8]  M. McGeoch,et al.  Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography. , 1998, Applied optics.

[9]  On the development of superconducting tunnel junctions for use in astronomy , 1999 .

[10]  Hans M. Hertz,et al.  A slit grating spectrograph for quantitative soft x-ray spectroscopy , 1999 .

[11]  Marco Wedowski,et al.  Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography , 1999, Optics & Photonics.

[12]  R. Stuik,et al.  Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography , 1999 .

[13]  Malcolm W. McGeoch.  Power scaling of a Z-pinch extreme ultraviolet source , 2000, Advanced Lithography.

[14]  R. Stuik,et al.  Portable diagnostics for EUV light sources , 2000, SPIE Optics + Photonics.

[15]  R. Stuik,et al.  Progress in Mo/Si multilayer coating technology for EUVL optics , 2000, Advanced Lithography.

[16]  Quan Wang,et al.  Focusing crystal von Hamos spectrometer for x-ray spectroscopy and x-ray fluorescence applications , 2000, SPIE Optics + Photonics.

[17]  E. A. Schneidmiller,et al.  Design considerations of 10 kW-scale, extreme ultraviolet SASE FEL for lithography , 2001 .

[18]  Frank Scholze,et al.  High-accuracy EUV metrology of PTB using synchrotron radiation , 2001, SPIE Advanced Lithography.

[19]  A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography , 2001 .

[20]  G. Fraser,et al.  Near K-edge linear attenuation coefficients for Si, SiO2 and Si3N4 , 2002 .

[21]  R. Stuik,et al.  Linearity of P-N junction photodiodes under pulsed irradiation , 2002 .