Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
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Angeliki Tserepi | Evangelos Gogolides | Vassilios Constantoudis | George P. Patsis | E. Gogolides | V. Constantoudis | A. Tserepi | G. Patsis | G. Grozev | G. Grozev
[1] James W. Taylor,et al. Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography , 1999 .
[2] E. W. Scheckler,et al. Resist pattern fluctuation limits in extreme‐ultraviolet lithography , 1994 .
[3] James W. Taylor,et al. Direct measurement of x-ray mask sidewall roughness and its contribution to the overall sidewall roughness of chemically amplified resist features , 1999 .
[4] S. C. Palmateer,et al. Comparison of metrology methods for quantifying the line edge roughness of patterned features , 1999 .
[5] F. Cerrina,et al. Process dependence of roughness in a positive-tone chemically amplified resist , 1998 .
[6] James W. Taylor,et al. Correlation of atomic force microscopy sidewall roughness measurements with scanning electron microscopy line-edge roughness measurements on chemically amplified resists exposed by x-ray lithography , 1999 .
[7] Lewis W. Flanagin,et al. Surface roughness development during photoresist dissolution , 1999 .
[8] K. Ronse,et al. Metrology method for the correlation of line edge roughness for different resists before and after etch , 2001 .
[9] Franco Cerrina,et al. Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length , 2002 .