论文信息 - Smooth plasma etching of GeSn nanowires for gate-all-around field effect transistors - 字舞流文

Smooth plasma etching of GeSn nanowires for gate-all-around field effect transistors

E. Eustache | B. Salem | S. David | F. Bassani | M. A. Mahjoub | J. Aubin | J. Hartmann | Y. Guerfi | S. Labau