Influence regularity of trace H2O on SF6 decomposition characteristics under partial discharge of needle-plate electrode
暂无分享,去创建一个
Qiang Yao | Ju Tang | Fuping Zeng | Xiaoxing Zhang | Q. Yao | Xiaoxing Zhang | Ju Tang | F. Zeng | Jianyu Pan | Xingzhe Hou | Jianyu Pan | Xingzhe Hou
[1] R. Seethapathy,et al. Characterization of GIS Spacers Exposed to SF6 Decomposition Products , 1987, IEEE Transactions on Electrical Insulation.
[2] M. Duval,et al. The duval triangle for load tap changers, non-mineral oils and low temperature faults in transformers , 2008, IEEE Electrical Insulation Magazine.
[3] Ju Tang,et al. Partial discharge recognition through an analysis of SF6 decomposition products part 2: feature extraction and decision tree-based pattern recognition , 2012, IEEE Transactions on Dielectrics and Electrical Insulation.
[4] R. J. Brunt. Present and future environmental "problems" with SF/sub 6/ and other fluorinated gases , 1996 .
[5] R. J. Brunt,et al. Identification of corona discharge-induced SF6 oxidation mechanisms using SF6/18O2/H216O and SF6/16O2/H218O gas mixtures , 1988 .
[6] I. C. Plumb,et al. Gas-phase reactions of CF3 and CF2 with hydrogen atoms: Their significance in plasma processing , 1984 .
[7] 唐炬,et al. Correlation Analysis between Formation Process of SF6 Decomposed Components and Partial Discharge Qualities , 2013 .
[8] Ju Tang,et al. Study on PD detection in SF6 using multi-wall carbon nanotube films sensor , 2010, IEEE Transactions on Dielectrics and Electrical Insulation.
[9] Tapan Kumar Saha,et al. Review of modern diagnostic techniques for assessing insulation condition in aged transformers , 2003 .
[10] R. J. Van Brunt,et al. Plasma chemical model for decomposition of SF6 in a negative glow corona discharge , 1994 .
[11] R. Grob,et al. Study of the decomposition of SF/sub 6/ in the presence of water, subjected to gamma irradiation or corona discharges , 1988 .
[12] Michel Duval,et al. A review of faults detectable by gas-in-oil analysis in transformers , 2002 .
[13] I. C. Plumb,et al. Gas-phase reactions of CF3 and CF2 with atomic and molecular fluorine: Their significance in plasma etching , 1986 .
[14] Xiaoxing Zhang,et al. TiO2 Nanotube Array Sensor for Detecting the SF6 Decomposition Product SO2 , 2012, Sensors.
[15] Ju Tang,et al. Partial discharge recognition through an analysis of SF6 decomposition products part 1: decomposition characteristics of SF6 under four different partial discharges , 2012, IEEE Transactions on Dielectrics and Electrical Insulation.
[16] F. Chu,et al. SF6 Decomposition in Gas-Insulated Equipment , 1986, IEEE Transactions on Electrical Insulation.
[17] E. E. Nikitin,et al. Gas-phase reactions , 1981 .
[18] J. Braun,et al. Novel Low-Cost SF6 Arcing Byproduct Detectors for Field Use in Gas-Insulated Switchgear , 1986, IEEE Power Engineering Review.
[19] I. C. Plumb,et al. Gas-phase reactions of CF2 with O(3P) to produce COF: Their significance in plasma processing , 1984 .
[20] R. J. Brunt,et al. Transfer of F− in the reaction of SF6− with SOF4: Implications for SOF4 production in corona discharges , 1988 .
[21] Michel Duval,et al. Interpretation of gas-in-oil analysis using new IEC publication 60599 and IEC TC 10 databases , 2001 .
[22] F. Y. Chu,et al. Novel Low-Cost SF6 Arcing Byproduct Detectors for Field Use in Gas-Insulated Switchgear , 1986, IEEE Transactions on Power Delivery.
[23] S. Ohtsuka,et al. Detection of SF6 decomposition products generated by DC corona discharge using a carbon nanotube gas sensor , 2012, IEEE Transactions on Dielectrics and Electrical Insulation.
[24] M. Duval,et al. Dissolved gas analysis: It can save your transformer , 1989, IEEE Electrical Insulation Magazine.
[25] I. C. Plumb,et al. A model of the chemical processes occurring in CF4/O2 discharges used in plasma etching , 1986 .
[26] R. J. Van Brunt,et al. Fundamental processes of SF/sub 6/ decomposition and oxidation in glow and corona discharges , 1990 .
[27] J. Casanovas,et al. Decomposition products from negative and 50 Hz ac corona discharges in compressed SF6 and SF6/N2 (10:90) mixtures. Effect of water vapour added to the gas , 1999 .
[28] I. C. Plumb,et al. A model for the etching of Si in CF4 plasmas: Comparison with experimental measurements , 1986 .