In situ high voltage tem observation of an electrohydrodynamic (EHD) ion source
暂无分享,去创建一个
[2] Yuh‐Lin Wang,et al. Focused ion beam microlithography using an etch‐stop process in gallium‐doped silicon , 1983 .
[3] H. Tanoue,et al. Maskless etching of a nanometer structure by focused ion beams , 1983 .
[4] B. Jouffrey,et al. Electronic environment for a field emission gun in electron microscopy , 1983 .
[5] J. Ward,et al. Trajectory calculations of the extraction region of a liquid‐metal ion source , 1981 .
[6] B. Jouffrey,et al. Triode and tetrode guns for field emission electron microscopes , 1981 .
[7] L. Swanson,et al. Angular intensity of a gas‐phase field ionization source , 1979 .
[8] R. Gomer. On the mechanism of liquid metal electron and ion sources , 1979 .
[9] R. L. Seliger,et al. A high‐intensity scanning ion probe with submicrometer spot size , 1979 .
[10] R. P. Frankenthal,et al. An AES study of the surface composition of ion-etched iron chromium alloys: effect of adsorbed CO , 1979 .
[11] L. Swanson,et al. Fine‐focus ion beams with field ionization , 1978 .
[12] T. R. Fox,et al. RESULTS WITH A PROTON SCANNING MICROSCOPE AND COMPARISON OF PROTON DAMAGE WITH ELECTRON DAMAGE * , 1978 .
[13] J. Orloff,et al. Study of a field‐ionization source for microprobe applications , 1975 .
[14] Peter H. Bartels,et al. Field ion microscopy;: Principles and applications, , 1969 .
[15] John Zeleny,et al. Instability of Electrified Liquid Surfaces , 1917 .
[16] L. Rayleigh. XX. On the equilibrium of liquid conducting masses charged with electricity , 1882 .