Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings
暂无分享,去创建一个
Quinn P. McAllister | Joshua K. Taggart-Scarff | K. Senecal | C. Oldham | G. Parsons | Sarah E. Atanasov | E. Wetzel | K. Slusarski | S. Filocamo | S. Sherman