Multi-vibrational hydrogen release: Physical origin of Tbd, Qbd power-law voltage dependence of oxide breakdown in ultra-thin gate oxides

Abstract In this work we report an experimental observation of the current dependence on the defect generation probability driving to breakdown. We propose the MVHR model (multi-vibrational hydrogen release) based on the multi-vibrational excitation of the Si–H bond stretching mode. By this way we explain the power-law dependence of charge and time to breakdown and highlight its limit on PMOS inversion.

[1]  James Stasiak,et al.  Trap creation in silicon dioxide produced by hot electrons , 1989 .

[2]  M. Denais,et al.  A thorough investigation of MOSFETs NBTI degradation , 2005, Microelectron. Reliab..

[3]  D. J. DiMaria Explanation for the oxide thickness dependence of breakdown characteristics of metal-oxide-semiconductor structures , 1997 .

[4]  N. Revil,et al.  Oxide field dependence of interface trap generation during negative bias temperature instability in PMOS , 2004, IEEE International Integrated Reliability Workshop Final Report, 2004.

[5]  L. Pantisano,et al.  Towards understanding degradation and breakdown of SiO2/high-k stacks , 2002, Digest. International Electron Devices Meeting,.

[6]  Hyunsang Hwang,et al.  High-quality ultrathin gate oxide prepared by oxidation in D2O , 1999 .

[7]  Peter Nordlander,et al.  Breaking individual chemical bonds via STM-induced excitations , 1996 .

[8]  C. Walle,et al.  Microscopic theory of hydrogen in silicon devices , 2000 .

[9]  Jordi Suñé,et al.  Experimental evidence of T/sub BD/ power-law for voltage dependence of oxide breakdown in ultrathin gate oxides , 2002 .

[10]  S. Mahapatra,et al.  A predictive reliability model for PMOS bias temperature degradation , 2002, Digest. International Electron Devices Meeting,.

[11]  peixiong zhao,et al.  Reactions of hydrogen with Si-SiO/sub 2/ interfaces , 2000 .

[12]  K. Stokbro,et al.  First-principles theory of inelastic currents in a scanning tunneling microscope , 1998, cond-mat/9802301.

[13]  J. Stathis,et al.  Reliability projection for ultra-thin oxides at low voltage , 1998, International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217).

[14]  Takahiro Yamasaki,et al.  Nano-scale simulation for advanced gate dielectrics , 2003 .

[15]  E. Cartier,et al.  MECHANISM FOR STRESS-INDUCED LEAKAGE CURRENTS IN THIN SILICON DIOXIDE FILMS , 1995 .

[16]  D. Arnold,et al.  Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon , 1993 .

[17]  Eduard A. Cartier,et al.  Anode hole injection and trapping in silicon dioxide , 1996 .

[18]  Elyse Rosenbaum,et al.  Anode hole injection versus hydrogen release: the mechanism for gate oxide breakdown , 2000, 2000 IEEE International Reliability Physics Symposium Proceedings. 38th Annual (Cat. No.00CH37059).

[19]  Hitoshi Ito,et al.  A Study of the Effect of Deuterium on Stress-Induced Leakage Current , 2000 .

[20]  E. Cartier,et al.  Hot carrier lifetime and dielectric breakdown in MOSFETs processed with deuterium , 2001, 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538).

[21]  Gerard Ghibaudo,et al.  Breakdown mechanisms in ultra-thin Oxides: impact of carrier energy and current through substrate hot carrier stress study , 2004 .

[22]  Bo N. J. Persson,et al.  Local bond breaking via STM-induced excitations: the role of temperature , 1997 .

[23]  W. R. Hunter,et al.  Experimental evidence for voltage driven breakdown models in ultrathin gate oxides , 2000, 2000 IEEE International Reliability Physics Symposium Proceedings. 38th Annual (Cat. No.00CH37059).

[24]  J R Tucker,et al.  Atomic-Scale Desorption Through Electronic and Vibrational Excitation Mechanisms , 1995, Science.