Spatial fluctuation of dielectric properties in Hf-based high-k gate films studied by scanning capacitance microscopy
暂无分享,去创建一个
S. Kamiyama | Y. Nara | H. Ogiso | K. Yasutake | Hiroshi Watanabe | A. Ando | Kunio Nakamura | Y. Naitou
暂无分享,去创建一个
S. Kamiyama | Y. Nara | H. Ogiso | K. Yasutake | Hiroshi Watanabe | A. Ando | Kunio Nakamura | Y. Naitou