Influence of N2 partial pressure on mechanical properties of (Ti,Al)N films deposited by reactive magnetron sputtering

[1]  M. Zlatanović,et al.  Plasma deposition of (Ti,Al)N coatings at various magnetron discharge power levels , 1991 .

[2]  G. Pharr,et al.  An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments , 1992 .

[3]  Jow-Lay Huang,et al.  Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films , 1997 .

[4]  K. Kim,et al.  Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al , 1997 .

[5]  B. Chenevier,et al.  Electron microscopy analysis of the microstructure of Ti1−xAlxN alloy thin films prepared using a chemical vapour deposition method , 1998 .

[6]  J. Musil,et al.  Superhard nanocomposite Ti1-xAlxN films prepared by magnetron sputtering , 2000 .

[7]  Jung Joong Lee,et al.  Structure and properties of (Ti1−xCrx)N coatings produced by the ion-plating method , 2001 .

[8]  Hyun-Seo Park,et al.  The properties of (Ti,Al)N coatings deposited by inductively coupled plasma assisted d.c. magnetron sputtering , 2001 .

[9]  N. Martin,et al.  Structure and composition of TixAl1−xN thin films sputter deposited using a composite metallic target , 2002 .

[10]  S. Hwang,et al.  Effects of nitrogen flow rates on the growth morphology of TiAlN films prepared by an rf-reactive sputtering technique , 2002 .

[11]  Yoshiaki Nakamura,et al.  Formation and oxidation properties of (Ti1−xAlx)N thin films prepared by dc reactive sputtering , 2002 .

[12]  Jia-Hong Huang,et al.  Effect of heat treatment on the structure and properties of ion-plated TiN films , 2003 .

[13]  A. Schütze,et al.  Thermal Treatment Effects on Microstructure and Mechanical Properties of TiAlN Thin Films , 2004 .

[14]  C. David,et al.  Structure, composition and microhardness of (Ti,Zr)N and (Ti,Al)N coatings prepared by DC magnetron sputtering , 2004 .

[15]  J. Bujak,et al.  Influence of the nitrogen pressure on the structure and properties of (Ti,Al)N coatings deposited by cathodic vacuum arc PVD process , 2004 .

[16]  Philip J. Martin,et al.  Nanocomposite Ti-Si-N, Zr-Si-N, Ti-Al-Si-N, Ti-Al-V-Si-N thin film coatings deposited by vacuum arc deposition , 2005 .

[17]  C. Mitterer,et al.  Structure, mechanical and tribological properties of sputtered Ti1–xAlxN coatings with 0.5≤x≤0.75 , 2005 .

[18]  H. Uchida,et al.  Structural and chemical characteristics of (Ti,Al)N films prepared by ion mixing and vapor deposition , 2006 .

[19]  Masataka Hakamada,et al.  Relationship between hardness and grain size in electrodeposited copper films , 2007 .